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Exposure time (minutes)

Fig. 14.1. Dependence of the resistivity of a K^O, film on exposure time to a K molecular beam in ultrahigh vacuum (UHV) at ambient temperature near 74°C. For this particular sample only the end point stoichiometry was determined explicitly; the stoichiometry at the minimum was determined from other similarly prepared samples. The arrows indicate changes in the resistivity of a similar sample, as it was heated from 60°C to 134°C. The dashed curve is a model fit to the data points [14.5],

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