Jw

wwwwMmmww

(D) Si anisotropic etching by hot KOH solution etch rate = lunvmln KOH etching

(E) Cg, deposition by thermal evaporation

;Si3N4 1000 AtWck

- Photoreisist ( t tun thick)

- Photoresist

- Photoresist

C^q membrane

C^q membrane

Fig. 9.12. Sequence of deposition and etching steps used to fabricate C60 membranes on (100) oriented Si [9.32],

Fig. 9.12. Sequence of deposition and etching steps used to fabricate C60 membranes on (100) oriented Si [9.32],

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