Chemical vapor deposition (CVD) Chemical vapor deposition is a generic name for a group of processes that involve depositing a solid material from a gas-phase process by the decomposition of volatile precursors at a suitable temperature either in the gaseous state or on the substrate, thereby eliminating organic fragments as by-products. Molecule-based materials (MBM) Material systems fabricated from molecular subunits, where the molecular integrity of the building units is maintained in the final configuration. Molecule-derived materials (MDM) Materials derived from molecular precursors in which the parent molecular framework is not (necessarily) maintained in the final material.

Single-source precursor (SSP) A molecular source containing all of the phase-forming elements in a single chemical compound, for example, gallium (fris)amide (Ga(NR2)3) for gallium nitride (GaN).

Sol-gel A room-temperature chemical method used for preparing high-purity ceramics by the hydrolysis of metal-organic compounds in particular metal alkoxides carried out under controlled pH, amount of water, and alkoxide concentration, which involves the transition of a liquid "sol" into a solid "gel" phase.

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