Preamble

By its very nature document security microtechnology is a subject much less able to be discussed in an open manner than many other areas of research and application. As well as the normal commercial in confidence issues, all companies, research groups and end users working in this area are mindful of the need to restrict the disclosure of information which might compromise the integrity of particular security devices being applied to protect official documents from counterfeiting. Not only are counterfeiting groups now much better organised in their activities, but they are also much more technology focussed in seeking to overcome new security measures. Holographic technology, foil embossing equipment, application processes and information associated with security device design is now being adopted by counterfeiters in their efforts to overcome the new security measures being introduced by the industry. However it is also important for the ongoing development of the industry that document security microstructure issues remain accessible to the research community. Only in this way can new ideas for improved security microstructures be developed and applied in order to stay ahead of the counterfeiters. With these issues and context in mind, this review will have a particular focus on the contribution of electron beam lithography to the development of particular optical security microstructures. It is this type of origination process, which is perceived by the industry to offer a higher level of counterfeit deterrence than the alternative hologram technologies.

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Brain Blaster

Brain Blaster

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