The resolution achievements of scanning near field optical microscopy of better than X/40 (Betzig 1991) suggest the potential for equivalent resolutions in near field lithography. An understanding of the near field mechanisms responsible for evanescent exposure are required to guide future ENFOL studies and to explore its potential as a nanolithography technique. Simulations have been undertaken to study the near field region behind conducting gratings.

Fig. 17.10. AFM images of a 270 nm period grating: (a) in photoresist following exposure and development (note it is only 45 nm thick), (b) in ARC and SiOx illustrating the improved profile following dry etching, (c) in 30 nm of NiCr following lift-off

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Brain Blaster

Brain Blaster

Have you ever been envious of people who seem to have no end of clever ideas, who are able to think quickly in any situation, or who seem to have flawless memories? Could it be that they're just born smarter or quicker than the rest of us? Or are there some secrets that they might know that we don't?

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