Summary and Outlook

The most interest for the future is the possibility of creating functional nanostructures by combining bottom-up self-organisation of self-assembled nanoentities, which occur in solution, with top-down lithographic approaches such as e-beam lithography. The integration of the top-down and bottom-up methodologies, that has been termed precision chemical engineering, and is representing a new paradigm for creating nano structured surfaces, and is being actively pursued by a number of groups within the scientific and engineering communities. Significant progress in understanding the chemical and physical modifications of SAMs by e-beam irradiation has been achieved over the past decade. First demonstrations of SAM-based nanolithography exist using this technique, but their development into practical commercial methods for low cost, high-volume processing still requires great efforts. Several factors have to be considered as a collective in order to achieve such a major task. Future work should attempt to establish the ultimate resolution limits for patterning of SAMs using e-beam exposure sources. Sufficiently low exposure doses for nanopatterning will be also necessary to ensure adequate throughput during manufacture. Additionally, irradiation must yield well-defined surface products in sufficient quantities such that useful amounts of the desired nanoscale components can be subsequently and selectively attached onto the surface. A minimal number of post-irradiation high selective chemical attachment steps (ideally, a single step) using inexpensive, simple reagents will also be beneficial to minimise process cost.

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Brain Blaster

Brain Blaster

Have you ever been envious of people who seem to have no end of clever ideas, who are able to think quickly in any situation, or who seem to have flawless memories? Could it be that they're just born smarter or quicker than the rest of us? Or are there some secrets that they might know that we don't?

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