Chemical Vapor Deposition

MOCVD [34] was used to prepare high quality thin films of various compositions [35]. Briefly, metal-organic precursors are dissolved in an ether and injected into the low pressure apparatus. In contrast to the methods previously described, this one does not require a high vacuum but allows deposition at higher oxygen pressure. In the case of CMR films, the 2,2,6,6-tetramethyl-3,5 heptane-dionato (TMHD) organometallics used for La, Ca, Sr, and Mn are, for example, respectively tris(TMHD) lanthanum, bis(TMHD) strontium hydrate, bis(TMHD) calcium, and tris(TMHD) manganese [36].

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